000112558 001__ 112558
000112558 005__ 20181203020947.0
000112558 0247_ $$2doi$$a10.1016/j.mee.2007.01.151
000112558 022__ $$a0167-9317
000112558 037__ $$aARTICLE
000112558 245__ $$aFabrication of diffraction gratings for hard X-ray phase contrast imaging
000112558 260__ $$c2007
000112558 269__ $$a2007
000112558 336__ $$aJournal Articles
000112558 520__ $$aWe have developed a method for X-ray phase contrast imaging, which is based on a grating interferometer. The technique is capable of recording the phase shift of hard X-rays travelling through a sample, which greatly enhances the contrast of low absorbing specimen compared to conventional amplitude contrast images. Unlike other existing X-ray phase contrast imaging methods, the grating interferometer also works with incoherent radiation from a standard X-ray tube. The key components are three gratings with silicon and gold structures, which have dimensions in the micrometer range and high aspect ratios. The fabrication processes, which involve photolithography, anisotropic wet etching, and electroplating, are described in this article for each of the three gratings. An example of an X-ray phase contrast image acquired with the grating interferometer is given.
000112558 700__ $$aDavid, C.
000112558 700__ $$aBruder, J.
000112558 700__ $$aRohbeck, T.
000112558 700__ $$aGrunzweig, C.
000112558 700__ $$aKottler, C.
000112558 700__ $$aDiaz, A.
000112558 700__ $$aBunk, O.
000112558 700__ $$g181576$$aPfeiffer, F.$$0240201
000112558 773__ $$j84$$tMicroelectronic Engineering$$k5-8$$q1172-1177
000112558 909C0 $$0252063$$pLSXC
000112558 909CO $$particle$$ooai:infoscience.tind.io:112558
000112558 937__ $$aLSXC-ARTICLE-2007-003
000112558 970__ $$a4/LSXC
000112558 973__ $$rREVIEWED$$sPUBLISHED$$aEPFL
000112558 980__ $$aARTICLE