000112536 001__ 112536
000112536 005__ 20181203020946.0
000112536 022__ $$a0021-8898
000112536 037__ $$aARTICLE
000112536 245__ $$aReflection of waveguided X-rays in two-dimensional nanostructures
000112536 260__ $$c2002
000112536 269__ $$a2002
000112536 336__ $$aJournal Articles
000112536 500__ $$aPart 4
000112536 520__ $$aThe internal reflection of an excited X-ray waveguide mode in a synthetic nanostructure, defined by electron-beam lithography, has been measured. In this device, the X-ray beam is first coupled into a conventional vertical thin-film waveguide structure and then reflected laterally at the quasi-one-dimensional edge of the waveguiding layer. The reflectivity of the quasi-one-dimensional interface has been recorded under simultaneous excitation of the (vertical) waveguide mode. The experiment constitutes an important step towards the production of a coherent nanometre-sized X-ray point source by two-dimensionally defined waveguide structures
000112536 700__ $$0240201$$g181576$$aPfeiffer, F.
000112536 700__ $$aSalditt, T.
000112536 700__ $$aDavid, C.
000112536 773__ $$j35$$tJournal of Applied Crystallography$$q430-433
000112536 909C0 $$0252063$$pLSXC
000112536 909CO $$particle$$ooai:infoscience.tind.io:112536
000112536 937__ $$aLSXC-ARTICLE-2002-002
000112536 970__ $$a28/LSXC
000112536 973__ $$rREVIEWED$$sPUBLISHED$$aEPFL
000112536 980__ $$aARTICLE