High Tunning Range AISi RF MEMS Capacitors Fabricated with Sacrificial Amorphous Silicon Surface Micromachining
2003
Details
Title
High Tunning Range AISi RF MEMS Capacitors Fabricated with Sacrificial Amorphous Silicon Surface Micromachining
Author(s)
Fritschi, R. ; Frédérico, S. ; Hibert, C. ; Flückiger, Ph. ; Renaud, Ph. ; Tsamados, D. ; Boussey, J. ; Chovet, A. ; Udrea, F. ; Curty, J.-P. ; Dehollain, C. ; Declercq, M. ; Ionescu, A. M.
Published in
Microelectronic Engineering
Volume
73–74
Pages
447-451
Conference
Micro and Nano Engineering 2003 (MNE 2003), Cambridge, UK, 22-25 September 2003
Date
2003
Other identifier(s)
View record in Web of Science
DAR: 5303
DAR: 5303
Laboratories
NANOLAB
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > NANOLAB - Nanoelectronic Devices Laboratory
Conference Papers
Work produced at EPFL
Published
Conference Papers
Work produced at EPFL
Published
Record creation date
2007-10-10