Experimental study of the process dependence of Mo, Cr, Ti, and W silicon Schottky diodes and contact resistance
2006
Details
Title
Experimental study of the process dependence of Mo, Cr, Ti, and W silicon Schottky diodes and contact resistance
Author(s)
Moselund, K. E. ; Freiermuth, J. E. ; Dainesi, P. ; Ionescu, A. M.
Published in
IEEE Transactions on Electron Devices
Volume
53
Issue
4
Pages
712-718
Date
2006
Other identifier(s)
View record in Web of Science
Laboratories
NANOLAB
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > NANOLAB - Nanoelectronic Devices Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2007-05-16