90 MHz nanomechanical structures fabricated by stencil deposition and dry etching

We present a simple method for fabricating fast resonating (90 MHz) nanomechanical elements based on the local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the substrate. The measured resonance frequency of a fabricated nanomechanical structure shows high resonance frequency up to 90 MHz. This resistless and dry process provides a flexible, rapid and stiction-free approach for the fabrication of ultra-fast resonating elements in various materials.


Published in:
Proceedings of 12th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers ’03)
Presented at:
12th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers ’03), Boston, USA, 8-12 June, 2003
Year:
2003
Laboratories:


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 Record created 2007-04-13, last modified 2018-03-17

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