000101364 001__ 101364
000101364 005__ 20181203020750.0
000101364 037__ $$aARTICLE
000101364 245__ $$aNanostenciling for combinatorial fabrications and interconnections of nanopatterns and microelectrodes
000101364 269__ $$a2007
000101364 260__ $$c2007
000101364 336__ $$aJournal Articles
000101364 520__ $$aStencil lithography is used for patterning and connecting nanostructures with metallic microelectrodes in ultrahigh vacuum. Microelectrodes are fabricated by static stencil deposition through a thin silicon nitride membrane. Arbitrary nanoscale patterns are then deposited at a predefined position relative to the microelectrodes, using as a movable stencil mask an atomic force microscopy (AFM) cantilever in which apertures have been drilled by focused ion beam. Large scale AFM imaging, combined with the use of a high precision positioning table, allows inspecting the microelectrodes and positioning the nanoscale pattern with accuracy better than 100 nm.
000101364 700__ $$aGuo, H
000101364 700__ $$aMartrou, D
000101364 700__ $$aZambelli, T
000101364 700__ $$aPolesel-Maris, J
000101364 700__ $$aPiednoir, A
000101364 700__ $$aDujardin, E
000101364 700__ $$aGauthier, S
000101364 700__ $$0240119$$avan den Boogaart, M A F$$g152156
000101364 700__ $$aDoeswijk, L M
000101364 700__ $$0240120$$aBrugger, J$$g145781
000101364 773__ $$j15$$k10$$tVirtual Journal of Nanoscale Science & Technology
000101364 909C0 $$0252040$$pLMIS1$$xU10321
000101364 909CO $$ooai:infoscience.tind.io:101364$$pSTI$$particle
000101364 937__ $$aLMIS1-ARTICLE-2007-017
000101364 973__ $$aEPFL$$rREVIEWED$$sPUBLISHED
000101364 980__ $$aARTICLE