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Abstract

Our research is centered on the engineering of structures at the mesoscopic length scale. Patterns between the micrometer and nanometer bridge molecules and biological cells to microelectronics and microsystems, and further to the macroworld, and vice versa. Standard photo-resist based lithography and micro/nano-fabrication methods, however, reach limits when applied to advanced micro- and nano-electromechanical systems (MEMS/NEMS). New alternative nanopatterning methods, such as local vacuum deposition through nanostencils, scanning probe methods, as well as nanostrucuturing with focused ion beam (FIB), are therefore being further developed in our lab. Some of our research activities, which cover the mesoscopic length scale that can bridge the “Top-Down” engineering methods and the “Bottom-Up” self-organization strategies, will be presented in this talk.

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