90 MHz nanomechanical structures fabricated by stencil deposition and dry etching

We present a simple method for fabricating nanomechanical elements with ultra high resonance frequency. The process is based on local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the substrate. The resonance frequency of a fabricated Al/SiN nanomechanical structure has been measured using a hetrodyne doppler interferometer to be up to 90 MHz. This resistless and dry process provides a flexible, rapid and stiction-free approach for the fabrication of high frequency resonating elements in various materials.

Presented at:
12th International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers ’03), Boston, USA, 8-12 June, 2003

 Record created 2007-03-02, last modified 2018-03-17

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