90 MHz nanomechanical structures fabricated by stencil deposition and dry etching

We present a simple method for fabricating nanomechanical elements with ultra high resonance frequency. The process is based on local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the substrate. The resonance frequency of a fabricated Al/SiN nanomechanical structure has been measured using a hetrodyne doppler interferometer to be up to 90 MHz. This resistless and dry process provides a flexible, rapid and stiction-free approach for the fabrication of high frequency resonating elements in various materials.


    • LMIS1-POSTER-2007-022

    Record created on 2007-03-02, modified on 2016-08-08


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