Oxygen impurity effects on the formation of thin titanium silicide films by rapid thermal annealing
1990
Details
Title
Oxygen impurity effects on the formation of thin titanium silicide films by rapid thermal annealing
Author(s)
Heintze, M ; Catana, A ; Schmid, PE ; Lévy, F ; Stadelmann, PA ; Weiss, P
Published in
Journal of Physics D: Applied Physics
Volume
23
Issue
8
Pages
1076-1081
Date
1990
Other identifier(s)
View record in Web of Science
Laboratories
CIME
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > CIME - Interdisciplinary Center for Electron Microscopy
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2007-02-15