LF55GN Photosensitive Flexopolymer as a New Material for Ultra-Thick and High-Aspect-Ratio MEMS Fabrication
2007
Details
Title
LF55GN Photosensitive Flexopolymer as a New Material for Ultra-Thick and High-Aspect-Ratio MEMS Fabrication
Author(s)
Sayah, A. ; Parashar, V.K. ; Gijs, M.A.M.
Published in
Technical Digest of the IEEE MEMS 2007
Pages
219-222
Conference
MEMS 2007, Kobe, Japan, January 21-25, 2007
Date
2007
Other identifier(s)
View record in Web of Science
Laboratories
LMIS2
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS2 - Microsystems Laboratory 2
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Record creation date
2007-02-13