LF55GN Photosensitive Flexopolymer as a New Material for Ultra-Thick and High-Aspect-Ratio MEMS Fabrication


Published in:
Technical Digest of the IEEE MEMS 2007, 219-222
Presented at:
MEMS 2007, Kobe, Japan, January 21-25, 2007
Year:
2007
Laboratories:




 Record created 2007-02-13, last modified 2018-03-17


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