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  4. Analysis and Modeling of Lateral Non-Uniform Doping in High-Voltage MOSFETs
 
conference paper

Analysis and Modeling of Lateral Non-Uniform Doping in High-Voltage MOSFETs

Chauhan, Y. S.  
•
Krummenacher, F.
•
Anghel, C.
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2006
IEEE International Electron Device Meeting, IEDM 2006
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Type
conference paper
DOI
10.1109/IEDM.2006.347000
Web of Science ID

WOS:000247357700224

Author(s)
Chauhan, Y. S.  
Krummenacher, F.
Anghel, C.
Gillon, R.
Bakeroot, B.
Declercq, M.  
Ionescu, A. M.  
Date Issued

2006

Published in
IEEE International Electron Device Meeting, IEDM 2006
Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
NANOLAB  
Available on Infoscience
May 16, 2007
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/6969
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