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  4. Near-Field Integration of a Si3N4 Nanobeam and a SiO2 Microcavity for Heisenberg-Limited Displacement Sensing
 
conference paper

Near-Field Integration of a Si3N4 Nanobeam and a SiO2 Microcavity for Heisenberg-Limited Displacement Sensing

Schilling, R.  
•
Schutz, H.
•
Ghadimi, A.  
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2016
2016 Conference On Lasers And Electro-Optics (Cleo)
Conference on Lasers and Electro-Optics (CLEO)

A single-chip radio-frequency optomechanical system, consisting of a Si3N4 nanobeam in the evanescent near-field of a SiO2 optical microdisk resonator realizes displacement imprecision >30dB below the standard quantum limit at room-temperature.

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Type
conference paper
DOI
10.1364/CLEO_SI.2016.STu1H.1
Web of Science ID

WOS:000391286403245

Author(s)
Schilling, R.  
Schutz, H.
Ghadimi, A.  
Sudhir, V.  
Wilson, D. J.  
Kippenberg, T. J.  
Date Issued

2016

Publisher

Ieee

Publisher place

New York

Published in
2016 Conference On Lasers And Electro-Optics (Cleo)
ISBN of the book

978-1-9435-8011-8

Total of pages

2

Series title/Series vol.

Conference on Lasers and Electro-Optics

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LPQM  
Event nameEvent placeEvent date
Conference on Lasers and Electro-Optics (CLEO)

San Jose, CA

JUN 05-10, 2016

Available on Infoscience
February 17, 2017
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/134409
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