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  4. Interplay of cavity thickness and metal absorption in thin-film InGaN photonic crystal light-emitting diodes
 
research article

Interplay of cavity thickness and metal absorption in thin-film InGaN photonic crystal light-emitting diodes

Rangel, Elizabeth
•
Matioli, Elison  
•
Chen, Hung-Tse
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2010
Applied Physics Letters

Thin-film InGaN photonic crystal (PhC) light-emitting diodes (LEDs) with a total semiconductor thickness of either 800 nm or 3.45 mu m were fabricated and characterized. Increased directional radiance relative to Lambertian emission was observed for both cases. The 800-nm-thick PhC LEDs yielded only a slight improvement in total light output over the 3.45-mu m-thick PhC LEDs. Simulations indicate that, except for ultrathin devices well below 800 nm, the balance between PhC extraction and metal absorption at the backside mirror results in modal extraction efficiencies that are almost independent of device thickness, but highly dependent on mirror reflectivity. (C) 2010 American Institute of Physics. [doi:10.1063/1.3480421]

  • Details
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Type
research article
DOI
10.1063/1.3480421
Author(s)
Rangel, Elizabeth
Matioli, Elison  
Chen, Hung-Tse
Choi, Yong-Seok
Weisbuch, Claude
Speck, James S.
Hu, Evelyn L.
Date Issued

2010

Publisher

Amer Inst Physics

Published in
Applied Physics Letters
Volume

97

Issue

6

Article Number

061118

Subjects

gallium compounds

•

III-V semiconductors

•

indium compounds

•

light emitting diodes

•

optical fabrication

•

photonic crystals

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

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POWERLAB  
Available on Infoscience
March 17, 2016
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/125015
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