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conference paper
Breaking the diffraction limit with plasmon optics: 20 nm optical lithography using 600 nm illumination wavelength
2002
Proc. Micro- and nano engineering
Type
conference paper
Authors
Publication date
2002
Published in
Proc. Micro- and nano engineering
Volume
1
Start page
98
End page
99
Subjects
Peer reviewed
REVIEWED
EPFL units
Event name | Event place | Event date |
Lugano, Switzerland | September 16-19 2002 | |
Available on Infoscience
February 14, 2012
Use this identifier to reference this record