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  4. AlInN as high-index-contrast material for GaN-based optoelectronics
 
conference paper

AlInN as high-index-contrast material for GaN-based optoelectronics

Dorsaz, J.  
•
Zellweger, C.
•
Gradecak, S.
Show more
2004
2003 International Symposium On Compound Semiconductors: Post-Conference Proceedings
30th International Symposium on Compound Semiconductors

High quality AlInN was grown near lattice-matched to GaN. It shows about 7% index contrast with GaN. AlInN is thus a promising alternative to AlGaN, as demonstrated by a 20-pairs AlInN/GaN distributed Bragg reflector with over 90% reflectivity. Light emitting diodes with active layers grown on top of AlInN/GaN multi-layers exhibit internal quantum efficiencies comparable to those of reference diodes grown directly on GaN buffer, this further demonstrate that AlInN material quality can meet the needs of optoelectronic application.

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Type
conference paper
DOI
10.1109/ISCSPC.2003.1354428
Author(s)
Dorsaz, J.  
Zellweger, C.
Gradecak, S.
Ilegems, M.
Carlin, J. F.  
Date Issued

2004

Publisher

Ieee

Published in
2003 International Symposium On Compound Semiconductors: Post-Conference Proceedings
Start page

36

End page

41

Subjects

Molecular-Beam Epitaxy

•

Distributed Bragg Reflectors

•

Chemical-Vapor-Deposition

•

Films

•

Mirrors

•

Algainn

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LASPE  
Event nameEvent placeEvent date
30th International Symposium on Compound Semiconductors

San Diego, CA

Aug 25-27, 2003

Available on Infoscience
October 13, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/55448
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