Schottky Barrier Formation by Silicon Deposition on Unreactive and Reactive Metal Substrates

Chang, Y.; Hanson, J.; Hwu, Y.; Zanini, F.; Margaritondo, G.

doi:10.1116/1.575872

research article

Schottky Barrier Formation by Silicon Deposition on Unreactive and Reactive Metal Substrates

Chang, Y.

•

Hanson, J.

•

Hwu, Y.

more

1989

Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films

Type

research article

DOI

10.1116/1.575872

Authors

Chang, Y.

•

Hanson, J.

•

Hwu, Y.

•

Zanini, F.

•

Margaritondo, G.

Publication date

1989

Published in

Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films

Volume

7

Issue

3

Start page

717

End page

719

Note

Univ wisconsin,dept phys,madison,wi 53706. univ wisconsin,ctr synchrotron radiat,madison,wi 53706.

ISI Document Delivery No.: U7153

Part 1

Peer reviewed

REVIEWED

EPFL units

LSE

LPRX

Available on Infoscience

October 3, 2006

Use this identifier to reference this record

https://infoscience.epfl.ch/handle/20.500.14299/234478