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  4. Thermal modeling of laser-annealing-induced crystallization of amorphous NiTi thin films
 
research article

Thermal modeling of laser-annealing-induced crystallization of amorphous NiTi thin films

Wang, Xi
•
Bellouard, Yves  
•
Xue, Zhenyu
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2008
Applied Physics A

Laser annealing of shape memory alloy thin films provides new opportunities in actuator design and fabrication for microelectromechanical systems applications. In this paper, we present a three-dimensional thermal model to simulate the crystallization process when a laser beam is swept across an amorphous NiTi thin film. Experimental crystallite nucleation and growth rates are included in the model to enable prediction of the size of the crystallized region as a function of laser annealing parameters. The model can also be used to study the crystallization of other material systems by means of laser annealing.

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Type
research article
DOI
10.1007/s00339-007-4331-z
Author(s)
Wang, Xi
Bellouard, Yves  
Xue, Zhenyu
Vlassak, Joost J.
Date Issued

2008

Published in
Applied Physics A
Volume

90

Issue

4

Start page

689

End page

694

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
GALATEA  
Available on Infoscience
July 20, 2015
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/116390
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