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  4. Thermal-Conversion of N-Type Gaas-Si to P-Type in Excess Arsenic Vapor
 
research article

Thermal-Conversion of N-Type Gaas-Si to P-Type in Excess Arsenic Vapor

Ky, N. H.
•
Pavesi, L.
•
Araujo, D.
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1991
Journal of Applied Physics

Annealing in excess arsenic vapor at 650-degrees-C introduces thermal conversion of n-type Si-doped GaAs samples (n = 1.3 X 10(18) cm-3) into p type. The observations are made by current-voltage and electron-beam induced current measurements. The donor concentration on the n side near the junction decreases after annealing. We present a comparison between the photoluminescence spectra of samples annealed under different conditions and an analysis of depth profile of the photoluminescence spectra. Our results underline the important role of gallium vacancies and gallium vacancy-silicon donor complex in the thermal conversion.

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Type
research article
DOI
10.1063/1.349196
Web of Science ID

WOS:A1991GJ67500075

Author(s)
Ky, N. H.
Pavesi, L.
Araujo, D.
Ganiere, J. D.  
Reinhart, F. K.
Date Issued

1991

Published in
Journal of Applied Physics
Volume

70

Issue

7

Start page

3887

End page

3891

Subjects

SEMI-INSULATING GAAS

•

BULK GAAS

•

PHOTOLUMINESCENCE

•

VACANCIES

•

CRYSTALS

Note

Univ trento,dept phys,i-38050 trent,italy. Ky, nh, swiss fed inst technol,inst microelectr & optoelectr,ch-1015 lausanne,switzerland.

ISI Document Delivery No.: GJ675

Cited Reference Count: 29

Cited References:

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MORROW RA, 1991, J APPL PHYS, V69, P3396

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WYSOCKI JJ, 1960, J APPL PHYS, V31, P1686

XU HQ, 1990, PHYS REV B, V41, P5979

Editorial or Peer reviewed

REVIEWED

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Available on Infoscience
August 31, 2007
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/11018
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