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  4. Nanostencil lithography for high-throughput fabrication of infrared plasmonic sensors
 
conference paper

Nanostencil lithography for high-throughput fabrication of infrared plasmonic sensors

Aksu, Serap
•
Yanik, Ahmet A.
•
Adato, Ronen
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George, T.
•
Islam, M. S.
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2011
Micro- and Nanotechnology Sensors, Systems, and Applications III
Conference on Micro- and Nanotechnology Sensors, Systems, and Applications III

We demonstrate a novel fabrication approach for high-throughput fabrication of engineered infrared plasmonic nanorod antenna arrays with Nanostencil Lithography (NSL). NSL technique, relying on deposition of materials through a shadow mask, offers the flexibility and the resolution to fabricate radiatively engineer nanoantenna arrays for excitation of collective plasmonic resonances. Overlapping these collective plasmonic resonances with molecular specific absorption bands can enable ultrasensitive vibrational spectroscopy. First, nanorod antenna arrays fabricated using NSL are investigated using SEM and optical spectroscopy, and compared against the nanorods with the same dimensions fabricated using EBL. No irregularities on the periodicity or the physical dimensions are detected for NSL fabricated nanorods. We also confirmed that the antenna arrays fabricated by NSL shows high optical quality similar to EBL fabricated ones. Furthermore, we show nanostencils can be reused multiple times to fabricate selfsame structures with identical optical responses repeatedly and reliably. This capability is particularly useful when high-throughput replication of the optimized nanoparticle arrays is desired. In addition to its high-throughput capability, NSL permits fabrication of plasmonic devices on surfaces that are difficult to work with electron/ion beam techniques. Nanostencil lithography is a resist free process thus allows the transfer of the nanopatterns to any planar substrate whether it is conductive, insulating or magnetic. As proof of the versatility of the NSL technique, we show fabrication of plasmonic structures in variety of geometries. We also demonstrate that nanostencil lithography can be used to achieve functional plasmonic devices in a single fabrication step, on variety of substrates. We introduced NSL for fabrication of nanoplasmonic structures including antenna arrays on rigid surfaces such as silicon, CaF2 and glass. In conclusion, Nanostencil Lithography enables plasmonic substrates supporting spectrally narrow far-field resonances with enhanced near-field intensities which are very useful for vibrational spectroscopy. We believe this nanofabrication scheme, enabling the reusability of stencil and offering flexibility on the substrate choice and nano-pattern design could significantly enhance wide-use of plasmonics in sensing technologies.

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Type
conference paper
DOI
10.1117/12.884105
Author(s)
Aksu, Serap
Yanik, Ahmet A.
Adato, Ronen
Artar, Alp
Huang, Min
Altug, Hatice
Editors
George, T.
•
Islam, M. S.
•
Dutta, A. K.
Date Issued

2011

Publisher

SPIE-INT SOC OPTICAL ENGINEERING

Published in
Micro- and Nanotechnology Sensors, Systems, and Applications III
ISBN of the book

978-0-8194-8605-9

Series title/Series vol.

Proceedings of SPIE; 8031

Start page

80312U

Subjects

infrared spectroscopy

•

nanoplasmonics

•

nanostencil lithography

•

near-field effects

•

optical nanoantenna

•

Shadow mask

•

surface plasmons

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
BIOS  
Event nameEvent placeEvent date
Conference on Micro- and Nanotechnology Sensors, Systems, and Applications III

Orlando, FL

APR 25-29, 2011

Available on Infoscience
August 16, 2016
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/128651
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