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research article

Modeling the diffusion and depletion capacitances of a silicon pn diode in forward bias with impedance spectroscopy

Casolaro, P.
•
Izzo, V.
•
Giusi, G.
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September 21, 2024
Journal of Applied Physics

We investigated the capacitance of a forward-biased silicon pn diode using impedance spectroscopy. Despite extensive research spanning decades, no single model in the literature adequately describes the impedance behavior for bias up to the built-in voltage. By employing the 1N4007 diode as a case study, we analyzed the impedance over a wide frequency range, from 1 Hz to 1 MHz. Our analysis reveals that impedance can be effectively studied by combining two models. In both models, the depletion capacitance is assumed to be an ideal capacitor with a value independent of frequency. One model accounts for diffusion processes, while the other addresses interfacial effects, as well as potential and capacitance distributions across the junction. This approach offers valuable insights into the complex capacitance behavior of pn junctions as a function of the bias voltage. Measurements of depletion and diffusion capacitances, as well as of the diode transit time can be achieved from a set of impedance spectroscopy data.

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Type
research article
DOI
10.1063/5.0230008
Scopus ID

2-s2.0-85205925680

Author(s)
Casolaro, P.

Università degli Studi di Napoli Federico II

Izzo, V.

Istituto Nazionale di Fisica Nucleare, Sezione di Napoli

Giusi, G.

Università degli Studi di Messina

Wyrsch, N.  

École Polytechnique Fédérale de Lausanne

Aloisio, A.

Università degli Studi di Napoli Federico II

Date Issued

2024-09-21

Published in
Journal of Applied Physics
Volume

136

Issue

11

Article Number

115702

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
PV-LAB  
FunderFunding(s)Grant NumberGrant URL

EU

Available on Infoscience
January 25, 2025
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/243870
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