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research article

A tunneling field-effect transistor exploiting internally combined band-to-band and barrier tunneling mechanisms

Lattanzio, Livio  
•
Biswas, Arnab  
•
De Michielis, Luca  
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2011
Applied Physics Letters

This letter proposes a hybrid abrupt switch principle and a corresponding device architecture that combines quantum mechanical band-to-band and barrier tunneling mechanisms. The device overcomes the intrinsically low on-current (I-ON) of conventional tunnel field-effect transistors (TFETs) and the 60 mV/dec subthreshold swing limitation of metal-oxide-semiconductor FETs at room temperature. The device principle and characteristics are studied through two-dimensional numerical simulations. The predicted performance of such hybrid TFET architecture, implementing an ultrathin (0.5 nm) tunneling dielectric between metal source and silicon channel are: average SS values as low as 43 mV/dec, I(ON similar to)49.3 mu A/mu m, and I-ON/I(OFF similar to)10(7). (c) 2011 American Institute of Physics. [doi:10.1063/1.3569760]

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Type
research article
DOI
10.1063/1.3569760
Web of Science ID

WOS:000288808200091

Author(s)
Lattanzio, Livio  
Biswas, Arnab  
De Michielis, Luca  
Ionescu, Adrian M.  
Date Issued

2011

Publisher

AIP American Institute of Physics

Published in
Applied Physics Letters
Volume

98

Issue

12

Article Number

123504

Subjects

Mosfets

•

Performance

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
NANOLAB  
Available on Infoscience
December 16, 2011
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/74300
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