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  4. Electronic properties of an epitaxial silicon oxynitride layer on a 6H-SiC(0001) surface: A first-principles investigation
 
research article

Electronic properties of an epitaxial silicon oxynitride layer on a 6H-SiC(0001) surface: A first-principles investigation

Devynck, F.  
•
Sljivancanin, Z.
•
Pasquarello, Alfredo  orcid-logo
2007
Applied Physics Letters

Using a density functional scheme, the authors investigate the electronic properties of an epitaxial silicon oxynitride layer on a 6H-SiC(0001) surface, as recently realized experimentally. Simulated scanning-tunneling-microscopy images of filled and empty states agree well with the experiment, lending support to the proposed atomic structure. In accord with the experiment, the local density of states indicates that the electronic band gap in the thin silicate layer at the surface is close to that of bulk SiO2. The authors show that this effect results from the surface of the epitaxial adlayer acting as a high-barrier potential for the SiC states induced in the oxide band gap.

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Type
research article
DOI
10.1063/1.2769949
Web of Science ID

WOS:000248661400057

Author(s)
Devynck, F.  
Sljivancanin, Z.
Pasquarello, Alfredo  orcid-logo

EPFL

Date Issued

2007

Publisher

American Institute of Physics

Published in
Applied Physics Letters
Volume

91

Issue

6

Article Number

061930

Subjects

numbers: 73.20.-r

•

68.35.Ct

•

71.15.Pd

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
CSEA  
Available on Infoscience
February 20, 2026
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/43521.2
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