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  4. Piezoresistive cantilevers in a commercial CMOS technology for intermolecular force detection
 
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conference paper

Piezoresistive cantilevers in a commercial CMOS technology for intermolecular force detection

Villanueva, G.  
•
Perez-Murano, F.
•
Zimmermann, M.
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2006
Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)
Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)

We report the development of piezoresistive cantilevers for intermolecular force detection in biochemical sensing, by using a commercial CMOS technology. The detection of the small forces involved in molecular recognition requires cantilevers with a small spring constant and high force sensitivity. We have fabricated polycrystalline silicon cantilevers by using the two polysilicon layers of a commercial CMOS process with minimum design rule widths. The cantilevers have been released by post-process micromachining. The upper polysilicon layer has been used as a piezoresistor. CMOS amplifying circuits have been integrated on-chip with the cantilever structures. The cantilevers have small spring constants ranging from 1.5 to 12 mN/m. The complete system has been successfully tested by applying a known transverse displacement with an AFM tip. A force sensitivity of 8 mu V/pN and resolution of 50 pN has been obtained. This high resolution is obtained with CMOS polysilicon, which has a relatively low piezoresistive coefficient, but this is compensated by the integration of signal-processing circuitry.

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Type
conference paper
Author(s)
Villanueva, G.  
•
Perez-Murano, F.
•
Zimmermann, M.
•
Lichtenberg, J.
•
Bausells, J.
Date Issued

2006

Published in
Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)
Volume

83

Issue

4-9

Start page

1302

End page

1305

Subjects

piezoresistive cantilever

•

cmos cantilever

•

force detection

•

microscopy

•

recognition

Note

Invited Talk

Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
NEMS  
Event nameEvent placeEvent date
Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)

Baltimore, USA

2006

Available on Infoscience
August 6, 2013
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/93863
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