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conference paper
Low-temperature and hydrogen-free silicon dioxide cladding for integrated photonics
2023
CLEO: Science and Innovations, CLEO:S and I 2023
We demonstrate a hydrogen-free low-loss silicon oxide film deposited with SiCl4 and O2 precursor. A very wide low-loss window of 1300 nm to 1620 nm is achieved at deposition temperature as low as 300 ◦C.
Type
conference paper
Scopus ID
2-s2.0-85191504464
Publication date
2023
Publisher
Published in
CLEO: Science and Innovations, CLEO:S and I 2023
ISBN of the book
9781957171258
Peer reviewed
REVIEWED
Written at
EPFL
| Event name | Event acronym | Event place | Event date |
San Jose, United States | 2023-05-07 - 2023-05-12 | ||
Available on Infoscience
January 26, 2025
Use this identifier to reference this record