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  4. Variability of Low Frequency Noise and mismatch in enclosed-gate and standard nMOSFETs
 
conference paper

Variability of Low Frequency Noise and mismatch in enclosed-gate and standard nMOSFETs

Bucher, Matthias  
•
Nikolaou, Aristeidis
•
Mavredakis, Nikolaos
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2017
2017 International Conference of Microelectronic Test Structures (ICMTS)
2017 International Conference of Microelectronic Test Structures (ICMTS)

Variability of Low Frequency Noise (LFN) and Random Telegraph Noise (RTN) is an important concern for many analog CMOS integrated circuits. In this paper, transistors with enclosed gate layout are examined and compared with standard layout transistors, with particular emphasis on weak inversion region. Enclosed gate transistors show an improved gate voltage mismatch in weak inversion. A compact MOSFET model for LFN and its variability, based on number fluctuation theory, is shown to cover well the behavior of either type of transistors. Lower levels of noise as well as lower variability of noise are observed in enclosed gate transistors.

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Type
conference paper
DOI
10.1109/ICMTS.2017.7954285
Web of Science ID

WOS:000413082200031

Author(s)
Bucher, Matthias  
Nikolaou, Aristeidis
Mavredakis, Nikolaos
Makris, Nikolaos
Coustans, Mathieu  
Lolivier, Jerome
Habas, Predrag
Acovic, Alexandre
Meyer, Rene
Date Issued

2017

Publisher

IEEE

Publisher place

New York

Published in
2017 International Conference of Microelectronic Test Structures (ICMTS)
Total of pages

4

Start page

1

End page

4

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
GR-KA  
Event nameEvent placeEvent date
2017 International Conference of Microelectronic Test Structures (ICMTS)

Grenoble, France

27-30 March 2017

Available on Infoscience
August 2, 2017
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/139511
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