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  4. The Photoemission Spectromicroscope Multiple-Application X-Ray-Imaging Undulator Microscope (Maximum)
 
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research article

The Photoemission Spectromicroscope Multiple-Application X-Ray-Imaging Undulator Microscope (Maximum)

Ng, W.
•
Raychaudhuri, A. K.
•
Crossley, S.
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1990
Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
  • Details
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Type
research article
DOI
10.1116/1.576736
Author(s)
Ng, W.
•
Raychaudhuri, A. K.
•
Crossley, S.
•
Crossley, D.
•
Gong, C.
•
Guo, J.
•
Hansen, R.
•
Margaritondo, G.  
•
Cerrina, F.
•
Underwood, J.
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Date Issued

1990

Published in
Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
Volume

8

Issue

3

Start page

2563

End page

2565

Note

Univ wisconsin,ctr synchrotron radiat,madison,wi 53706. univ calif berkeley lawrence berkeley lab,ctr xray opt,berkeley,ca 94720. univ wisconsin,dept elect & comp engn,madison,wi 53706. Ng, w, univ wisconsin,dept phys,madison,wi 53706.

ISI Document Delivery No.: DG238

Part 2

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LSE  
LPRX  
Available on Infoscience
October 3, 2006
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/234522
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