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research article

Hydrogen plasma treatment for improved conductivity in amorphous aluminum doped zinc tin oxide thin films

Morales-Masis, Monica
•
Ding, Laura  
•
Dauzou, Fabien
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2014
APL Materials

Improving the conductivity of earth-abundant transparent conductive oxides (TCOs) remains an important challenge that will facilitate the replacement of indium-based TCOs. Here, we show that a hydrogen (H-2)-plasma post-deposition treatment improves the conductivity of amorphous aluminum-doped zinc tin oxide while retaining its low optical absorption. We found that the H-2-plasma treatment performed at a substrate temperature of 50 degrees C reduces the resistivity of the films by 57% and increases the absorptance by only 2%. Additionally, the low substrate temperature delays the known formation of tin particles with the plasma and it allows the application of the process to temperature-sensitive substrates. (C) 2014 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.

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Type
research article
DOI
10.1063/1.4896051
Web of Science ID

WOS:000342568000035

Author(s)
Morales-Masis, Monica
Ding, Laura  
Dauzou, Fabien
Jeangros, Quentin  
Hessler-Wyser, Aicha  
Nicolay, Sylvain  
Ballif, Christophe  
Date Issued

2014

Publisher

Amer Inst Physics

Published in
APL Materials
Volume

2

Issue

9

Article Number

096113

Note

IMT-NE Number :748

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

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PV-LAB  
CIME  
Available on Infoscience
September 18, 2014
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/106976
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