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  4. HIGH-RESOLUTION ELECTRON-BEAM INJECTION IN SEMICONDUCTORS USING A SCANNING TUNNELING MICROSCOPE
 
research article

HIGH-RESOLUTION ELECTRON-BEAM INJECTION IN SEMICONDUCTORS USING A SCANNING TUNNELING MICROSCOPE

ALVARADO, SF
•
Renaud, Philippe  
•
MEIER, HP
1991
JOURNAL DE PHYSIQUE IV
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Type
research article
DOI
10.1051/jp4:1991641
Author(s)
ALVARADO, SF
Renaud, Philippe  
MEIER, HP
Date Issued

1991

Published in
JOURNAL DE PHYSIQUE IV
Volume

1

Issue

C6

Start page

271

End page

275

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
LMIS4  
Available on Infoscience
September 16, 2005
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/216673
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