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  4. Silicon-Based Chlorine Sensor with On-Wafer Deposited Chemically Anchored Diffusion Membrane
 
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research article

Silicon-Based Chlorine Sensor with On-Wafer Deposited Chemically Anchored Diffusion Membrane

van den Berg, A.
•
Koudelka-Hep, M.
•
van der Schoot, B.
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1992
Analytica Chimica Acta

A method for on-wafer fabrication of free-chlorine sensors is described. The sensor structure consists of a planar three-electrode electrochemical cell covered with a poly(hydroxyethyl methacrylate) hydrogel membrane. This membrane is photolithographically patterned on-wafer. In order to guarantee good adhesion of the membrane to the electrode surface a special oxidation step consisting of a treatment in an oxygen plasma followed by a silanization procedure has been developed. The optimal operational polarization voltage of the integrated sensor for detection of hypochlorous acid was found to be 0 mV vs. the on-chip Ag/AgCl reference electrode in a solution of 0.1 M KCl. Sensors with membrane thicknesses of 10 and 50 μm are found to give linear calibration curves between 0.1 and 5 mg l-1 free chlorine, with sensitivities of 2.0 and 0.4 nA (mg l-1)-1, respe tively.

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Type
research article
DOI
10.1016/0003-2670(92)85135-S
Author(s)
van den Berg, A.
•
Koudelka-Hep, M.
•
van der Schoot, B.
•
de Rooij, N. F.  
•
Verney-Norberg, E.
•
Grisel, A.
Date Issued

1992

Published in
Analytica Chimica Acta
Volume

269

Issue

1

Start page

75

End page

82

Note

73

Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
SAMLAB  
Available on Infoscience
May 12, 2009
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/39029
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