Repository logo

Infoscience

  • English
  • French
Log In
Logo EPFL, École polytechnique fédérale de Lausanne

Infoscience

  • English
  • French
Log In
  1. Home
  2. Academic and Research Output
  3. Conferences, Workshops, Symposiums, and Seminars
  4. Fabrication and electrical characterization of high performance copper/polyimide inductors
 
Loading...
Thumbnail Image
conference paper

Fabrication and electrical characterization of high performance copper/polyimide inductors

Pisani, M. B.  
•
Hibert, C.  
•
Bouvet, D.  
Show more
2005
Research in Microelectronics and Electronics, 2005 PhD
PRIME 2005

This paper presents fabrication and RF characterization results of spiral inductors fabricated using a developed damascene-like thick-copper / polyimide process module. This module has low thermal budget and is compatible with current IC interconnect architectures, making it suitable for CMOS above IC integration of high quality factor passive devices. Thick, high-conductive copper layers associated with low κ polymers and high resistivity substrates can provide RF performances that cannot be achieved using conventional thin aluminum films on low-resistivity substrates. Peak quality factors of about 20 and exceeding 10 over a wide frequency range (1-6 GHz) are demonstrated, with a self-resonant frequency of about 10 GHz. Measurements and equivalent circuit extraction results are also presented and discussed.

  • Details
  • Metrics
Type
conference paper
DOI
10.1109/RME.2005.1543035
Scopus ID

2-s2.0-33750362114

Author(s)
Pisani, M. B.  
•
Hibert, C.  
•
Bouvet, D.  
•
Dehollain, C.  
•
Ionescu, A. M.  
Date Issued

2005

Published in
Research in Microelectronics and Electronics, 2005 PhD
Volume

1

Start page

185

End page

188

Subjects

1 to 6 GHz

•

RF characterization

•

damascene-like thick-copper-polyimide process module

•

high performance copper/polyimide inductors

•

high resistivity substrates

•

high-conductive copper layers

•

low K polymers

•

self-resonant frequency

•

spiral inductors

•

copper

•

low-k dielectric thin films

•

thick film inductors

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
SCI-STI-CD  
NANOLAB  
Event nameEvent placeEvent date
PRIME 2005

Lausanne, Switzerland

2005-07-28

Available on Infoscience
May 21, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/50273
Logo EPFL, École polytechnique fédérale de Lausanne
  • Contact
  • infoscience@epfl.ch

  • Follow us on Facebook
  • Follow us on Instagram
  • Follow us on LinkedIn
  • Follow us on X
  • Follow us on Youtube
AccessibilityLegal noticePrivacy policyCookie settingsEnd User AgreementGet helpFeedback

Infoscience is a service managed and provided by the Library and IT Services of EPFL. © EPFL, tous droits réservés