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  4. GaN and AlxGa1-xN molecular beam epitaxy monitored by reflection high-energy electron diffraction
 
research article

GaN and AlxGa1-xN molecular beam epitaxy monitored by reflection high-energy electron diffraction

Grandjean, N.  
•
Massies, J.
1997
Applied Physics Letters

GaN and AlxGa1-xN alloys were grown by gas sourer molecular beam epitaxy using NH3. High quality GaN layers with smooth surfaces being obtained, reflection high-energy electron diffraction (RHEED) can be used to monitor the growth. The oscillations of the specular beam intensity indicate a layer-by-layer growth which allows one to precisely measure the deposition rate and the composition of AlxGa1-xN alloys. The transition from two dimensional nucleation to step flow growth mode when increasing the substrate temperature is also evidenced, Finally, RHEED is used to investigate the relaxation processes which take place during the growth of AlN on GaN and GaN on ALN. (C) 1997 American Institute of Physics.

  • Details
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Type
research article
DOI
10.1063/1.119408
Author(s)
Grandjean, N.  
Massies, J.
Date Issued

1997

Published in
Applied Physics Letters
Volume

71

Issue

13

Start page

1816

End page

1818

Subjects

HIGH GROWTH-RATES

•

NITROGEN-SOURCE

•

MBE

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
LASPE  
Available on Infoscience
October 5, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/54841
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