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research article
The Influence of the pH on the Electrolyte-SiO2-Si System Studied by Ion-sensitive Fet Measurements and Quasistatic C-V Measurements
1980
The responses of ion-sensitive FETs (ISFETs) with thermally grown SiO//2 gate regions and of electrolyte-SiO//2-Si (EOS) structures to stepwise changes in the pH were studied. A mechanism is also proposed in which one or other hydrogen-bearing species interacts with the surface states at the SiO//2-Si interface. This proposed mechanism is based on the observed time drift in the response of ISFETs and on the changes in the shape of the quasi-static C-V curves of the EOS structures.
Type
research article
Author(s)
Date Issued
1980
Published in
Volume
71
Issue
2
Start page
327
End page
331
Note
4
Peer reviewed
REVIEWED
Written at
OTHER
EPFL units
Available on Infoscience
May 12, 2009
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