conference paper
Resonantly Enhanced Near-Field Lithography
2008
2008 Conference On Lasers And Electro-Optics & Quantum Electronics And Laser Science Conference, Vols 1-9
We propose the combination of a planar optical resonator and a solid immersion lens for resonantly enhanced non-contact near-field lithography. Subwavelength small spots can be produced by exciting the Bessel modes of the resonator. (C) 2008 Optical Society of America
Type
conference paper
Web of Science ID
WOS:000260498401741
Author(s)
Tsang, Mankei
Date Issued
2008
Published in
2008 Conference On Lasers And Electro-Optics & Quantum Electronics And Laser Science Conference, Vols 1-9
Start page
3495
End page
3496
Editorial or Peer reviewed
REVIEWED
Written at
EPFL
EPFL units
| Event name | Event place | Event date |
San Jose, CA | May 04-09, 2008 | |
Available on Infoscience
November 25, 2010
Use this identifier to reference this record