conference paper not in proceedings
Modeling study of capacitance and gate current in strained HighK-Metal gate technology
2010
Type
conference paper not in proceedings
Author(s)
Rideau, Denis
Dornel, Erwan
Clark, William F.
Tavernier, Clement
Jaouen, Hervé
Date Issued
2010
Publisher
Written at
EPFL
EPFL units
| Event name | Event date |
2010 | |
Available on Infoscience
October 31, 2011
Use this identifier to reference this record