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  4. Time-resolved SiH4 density inside a chemical vapor deposition system: gas flow dynamics and glow discharge control
 
conference paper not in proceedings

Time-resolved SiH4 density inside a chemical vapor deposition system: gas flow dynamics and glow discharge control

Bartlome, Richard  
•
Descoeudres, Antoine  
•
Strahm, Benjamin
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2010
MRS Spring Meeting
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Type
conference paper not in proceedings
Author(s)
Bartlome, Richard  
Descoeudres, Antoine  
Strahm, Benjamin
Feltrin, Andrea
De wolf, stefaan  
Ballif, Christophe  
Date Issued

2010

Note

IMT-NE Number: 565

Editorial or Peer reviewed

NON-REVIEWED

Written at

EPFL

EPFL units
PV-LAB  
Event nameEvent placeEvent date
MRS Spring Meeting

San Francisco, USA

Apr. 5–9

Available on Infoscience
June 1, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/50549
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