Repository logo

Infoscience

  • English
  • French
Log In
Logo EPFL, École polytechnique fédérale de Lausanne

Infoscience

  • English
  • French
Log In
  1. Home
  2. Academic and Research Output
  3. Journal articles
  4. Control of leakage conduction of high-fatigue-endurance (Pb, La)(Zr, Ti)O-3 film ferroelectric capacitors with Pt/SrRuO3 electrodes
 
research article

Control of leakage conduction of high-fatigue-endurance (Pb, La)(Zr, Ti)O-3 film ferroelectric capacitors with Pt/SrRuO3 electrodes

Stolichnov, I.  
•
Tagantsev, A.  
•
Setter, N.  
Show more
1999
Applied Physics Letters

Leakage conduction of (Pb, La)(Zr, Ti)O-3 (PLZT) films grown on Pt bottom electrode, with Pt and Pt/SrRuO3 (Pt/SRO) top electrodes is studied. It is found that the conduction behavior of the ferroelectric capacitors strongly varies depending on the degree of interdiffusion from the electrode into the ferroelectric material. If the diffusion is limited, the conduction properties of the Pt/SRO/PLZT/Pt capacitor are similar to that of the conventional Pt/PLZT/Pt system. For the opposite case of excessive interdiffusion, the former exhibits much higher conduction than the latter. We found that the diffusion of the top electrode material can be controlled in two ways-either by varying Pb excess in the PLZT film or by controlling the SRO layer thickness. Schottky barrier measurements show that in the case of limited diffusion the potential barrier values of SRO/PLZT and Pt/PLZT interfaces are nearly equal. Based on our results we conclude that: (a) the Schottky barrier values of Pt/PLZT and SRO/PLZT contacts are similar and mainly controlled by Fermi level pinning at the interface rather than by work functions of electrode materials; (b) the leakage conduction of Pt/SRO/PLZT/Pt capacitors can be efficiently suppressed without losing good polarization fatigue performance. (C) 1999 American Institute of Physics. [S0003-6951(99)02038-0].

  • Details
  • Metrics
Type
research article
DOI
10.1063/1.124821
Web of Science ID

WOS:000082547100046

Author(s)
Stolichnov, I.  
Tagantsev, A.  
Setter, N.  
Cross, J. S.
Tsukada, M.
Date Issued

1999

Published in
Applied Physics Letters
Volume

75

Issue

12

Start page

1790

End page

1792

Subjects

thin-films

•

pb(zrxti1-x)o-3

Note

Stolichnov, I Swiss Fed Inst Technol, Ceram Lab, CH-1015 Lausanne, Switzerland Swiss Fed Inst Technol, Ceram Lab, CH-1015 Lausanne, Switzerland Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan

235NE

Cited References Count:13

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LC  
Available on Infoscience
August 21, 2006
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/233405
Logo EPFL, École polytechnique fédérale de Lausanne
  • Contact
  • infoscience@epfl.ch

  • Follow us on Facebook
  • Follow us on Instagram
  • Follow us on LinkedIn
  • Follow us on X
  • Follow us on Youtube
AccessibilityLegal noticePrivacy policyCookie settingsEnd User AgreementGet helpFeedback

Infoscience is a service managed and provided by the Library and IT Services of EPFL. © EPFL, tous droits réservés