Repository logo

Infoscience

  • English
  • French
Log In
Logo EPFL, École polytechnique fédérale de Lausanne

Infoscience

  • English
  • French
Log In
  1. Home
  2. Academic and Research Output
  3. Journal articles
  4. Tailoring dielectric permittivity of epitaxial Gd-doped CeO2-x films by ionic defects
 
research article

Tailoring dielectric permittivity of epitaxial Gd-doped CeO2-x films by ionic defects

Palliotto, A.
•
Wu, Y.
•
Rata, A. D.
Show more
April 1, 2024
Journal Of Physics-Energy

Engineering materials with highly tunable physical properties in response to external stimuli is a cornerstone strategy for advancing energy technology. Among various approaches, engineering ionic defects and understanding their roles are essential in tailoring emergent material properties and functionalities. Here, we demonstrate an effective approach for creating and controlling ionic defects (oxygen vacancies) in epitaxial Gd-doped CeO2-x (CGO)(001) films grown on Nb:SrTiO3(001) single crystal. Our results exhibit a significant limitation in the formation of excess oxygen vacancies in the films during high-temperature film growth. However, we have discovered that managing the oxygen vacancies in the epitaxial CGO(001) films is feasible using a two-step film growth process. Subsequently, our findings show that manipulating excess oxygen vacancies is a key to the emergence of giant apparent dielectric permittivity (e.g. epsilon ' approximate to 106) in the epitaxial films under electrical field control. Overall, the strategy of tuning functional ionic defects in CGO and similar oxides is beneficial for various applications such as electromechanical, sensing, and energy storage applications.

  • Files
  • Details
  • Metrics
Type
research article
DOI
10.1088/2515-7655/ad2452
Web of Science ID

WOS:001159923600001

Author(s)
Palliotto, A.
Wu, Y.
Rata, A. D.
Herklotz, A.
Zhou, S.
Doerr, K.
Muralt, P.  
Park, D-s
Date Issued

2024-04-01

Publisher

Iop Publishing Ltd

Published in
Journal Of Physics-Energy
Volume

6

Issue

2

Article Number

025005

Subjects

Technology

•

Functional Oxides

•

Doped Ceria

•

Ionic Defects

•

Thin Film Growth

•

Dielectric Permittivity

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
CIME  
FunderGrant Number

Fourth Framework Programmehttp://dx.doi.org/10.13039/100011105

111814

Villum Fonden

101054572

ERC Advanced grant

Available on Infoscience
February 23, 2024
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/205547
Logo EPFL, École polytechnique fédérale de Lausanne
  • Contact
  • infoscience@epfl.ch

  • Follow us on Facebook
  • Follow us on Instagram
  • Follow us on LinkedIn
  • Follow us on X
  • Follow us on Youtube
AccessibilityLegal noticePrivacy policyCookie settingsEnd User AgreementGet helpFeedback

Infoscience is a service managed and provided by the Library and IT Services of EPFL. © EPFL, tous droits réservés