Analysis of Substrate Currents Propagation in HVCMOS technology
This work reports the results of a layout-aware substrate modeling methodology for HVCMOS technologies. The model relies on the extraction of parasitic substrate network to simulate with circuit software parasitic lateral NPN bipolar transistors with multi-collector configuration. This allows to predict and analyze the injected substrate currents distribution through the chip and to explore different layout strategies to reduce the propagation of minority carriers through the substrate. Simulations results show good agreement in comparison with measurements at different temperatures.
WOS:000386655900076
2016
978-1-5090-2969-3
New York
4
Proceedings of the European Solid-State Device Research Conference
319
322
REVIEWED
Event name | Event place | Event date |
Lausanne, Switzerland | September 12-15, 2016 | |