Focused ion beam production of nanoelectrode arrays
We present a method for the production of nanoelectrodes using focussed ion beam techniques (FIB). The electrodes utilise nanometric holes milled in a silicon nitride based pasivation layer, followed by wet etching of a silicon oxide based pasivation layer, to expose an underlying gold electrode. After functionalisation using a surface assembled monolayer and an electrochemically grown polypyrrole, these gold nanoelectrodes have been tested, via cyclic voltammetry, in the detection of Fe(CN)(6) ions. The nanoelectrodes will be used to investigate the electrical properties of nanometric biological specimen. (c) 2007 Elsevier B.V. All rights reserved.
WOS:000258076100036
2008
28
5-6
777
780
Errachid, A Univ Barcelona, Nanobioengn Res Lab IBEC, CIBER, C Marti I Franques 1, E-08028 Barcelona, Spain Univ Barcelona, Nanobioengn Res Lab IBEC, CIBER, E-08028 Barcelona, Spain Univ Barcelona, Dept Elect, CIBER, E-08028 Barcelona, Spain CSIC, IMB, Ctr Nacl Microelect, Bellaterra 08193, Spain ICMAB CSIC, Barcelona, Spain
Sp. Iss. SI
332IG
Cited References Count:18
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