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  4. High electron mobility in AlGaN/GaN heterostructures grown on bulk GaN substrates
 
research article

High electron mobility in AlGaN/GaN heterostructures grown on bulk GaN substrates

Frayssinet, E.
•
Knap, W.
•
Lorenzini, P.
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2000
Applied Physics Letters

Dislocation-free high-quality AlGaN/GaN heterostructures have been grown by molecular-beam epitaxy on semi-insulating bulk GaN substrates. Hall measurements performed in the 300 K-50 mK range show a low-temperature electron mobility exceeding 60 000 cm(2)/V s for an electron sheet density of 2.4x10(12) cm(-2). Magnetotransport experiments performed up to 15 T exhibit well-defined quantum Hall-effect features. The structures corresponding to the cyclotron and spin splitting were clearly resolved. From an analysis of the Shubnikov de Hass oscillations and the low-temperature mobility we found the quantum and transport scattering times to be 0.4 and 8.2 ps, respectively. The high ratio of the scattering to quantum relaxation time indicates that the main scattering mechanisms, at low temperatures, are due to long-range potentials, such as Coulomb potentials of ionized impurities. (C) 2000 American Institute of Physics. [S0003-6951(00)01042-1].

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Type
research article
DOI
10.1063/1.1318236
Author(s)
Frayssinet, E.
Knap, W.
Lorenzini, P.
Grandjean, N.  
Massies, J.
Skierbiszewski, C.
Suski, T.
Grzegory, I.
Porowski, S.
Simin, G.
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Date Issued

2000

Published in
Applied Physics Letters
Volume

77

Issue

16

Start page

2551

End page

2553

Subjects

HETEROJUNCTIONS

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
LASPE  
Available on Infoscience
October 5, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/54910
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