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research article

50 nm thick AlN film-based piezoelectric cantilevers for gravimetric detection

Ivaldi, P.
•
Abergel, J.
•
Matheny, M. H.
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2011
Journal of Micromechanics and Microengineering

Due to low power operation, intrinsic integrability and compatibility with CMOS processing, aluminum nitride (AlN) piezoelectric (PZE) microcantilevers are a very attractive paradigm for resonant gas sensing. In this paper, we theoretically investigate their ultimate limit of detection and enunciate design rules for performance optimization. The reduction of the AlN layer thickness is found to be critical. We further report the successful development and implementation in cantilever structures with a 50 nm thick active PZE AlN layer. Material characterizations demonstrate that the PZE e(31) coefficient can remain as high as 0.8Cm(-2). Electrically transduced frequency responses of the fabricated devices are in good agreement with analytical predictions. Finally, we demonstrate the excellent frequency stability with a 10(-8) minimum Allan deviation. This exceptionally low noise operation allows us to expect a limit of detection as low as 53 zg mu m(-2) and demonstrate the strong potential of AlN PZE microcantilevers for high resolution gas detection.

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Type
research article
DOI
10.1088/0960-1317/21/8/085023
Web of Science ID

WOS:000293163700023

Author(s)
Ivaldi, P.
•
Abergel, J.
•
Matheny, M. H.
•
Villanueva, L. G.  
•
Karabalin, R. B.
•
Roukes, M. L.
•
Andreucci, P.
•
Hentz, S.
•
Defay, E.
Date Issued

2011

Published in
Journal of Micromechanics and Microengineering
Volume

21

Issue

8

Article Number

085023

Note

Ivaldi, P. Abergel, J. Matheny, M. H. Villanueva, L. G. Karabalin, R. B. Roukes, M. L. Andreucci, P. Hentz, S. Defay, E.

Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
NEMS  
Available on Infoscience
August 6, 2013
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/93812
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