research article
Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement
2008
The fabrication of devices to focus hard x-rays is one of the most difficult-and important-challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.
Type
research article
Web of Science ID
WOS:000258538800009
Author(s)
Chen, Yu-Tung
Lo, Tsung-Nan
Chu, Yong S.
Yi, Jaemock
Liu, Chi-Jen
Wang, Jun-Yue
Wang, Cheng-Liang
Chiu, Chen-Wei
Hua, Tzu-En
Hwu, Yeukuang
Date Issued
2008
Publisher
Published in
Volume
19
Issue
39
Article Number
395302
Subjects
Editorial or Peer reviewed
REVIEWED
Written at
EPFL
Available on Infoscience
November 30, 2010
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