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Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes
research article
Type
research article
Author(s)
Date Issued
1998
Published in
Volume
8
Issue
2
Start page
74
End page
76
Note
190
Peer reviewed
REVIEWED
Written at
OTHER
EPFL units
Available on Infoscience
May 12, 2009
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