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research article

Effect of dopants on the crystallization mechanism of PZT thin films

Klissurska, R. D.
•
Brooks, K. G.
•
Setter, N.  
1999
Ferroelectrics

The effects of donor (Nb, Ta) and acceptor (Na, Mg, Fe) dopants on the crystallization mechanism of PZT thin films were investigated. The parameters which control microstructure development were found to be different for donors and accepters. Lead stoichiometry was found to be the critical parameter for donor doped films. Donor substitutions in the perovskite lattice ABO(3), require a compensation by creation of A-site vacancies, Pb1-x/2(Zr,Ti)(1-x) NbxO3, in order to maintain electroneutrality. In the pyrochlore lattice A(2)B(2)O(7), however, compensation might occur either by creation of A-site vacancies, as in the perovskite Pb1-x/2(Zr, Ti)(1-x)Nb-xO(6)square' or by an increase in oxygen stoichiometry, Pb2+ (Zr, Ti)(1-x)Nb-4+(x)5+O6O'(x/2)square'(1-x/2), or by formation of a monoclinic structure with A to B ratio (1:3) Pb1-x/2(Zr, Ti)(3-x)NbxO7. Second phase retention is observed in the last two cases. Lead content controls which of the three stoichiometries will form. For acceptor dopants, it was found that the affinity of the dopant element to form pyrochlore phases with the host ions of PZT and the site of doping are critical parameters for microstructure development. The solubilities of accepters were found to be much higher in PZT films than in ceramics. This result leads to the hypothesis that the formation of holes versus oxygen vacancies is favored in acceptor doped films. The role of metallization on crystallization of doped films is discussed.

  • Details
  • Metrics
Type
research article
DOI
10.1080/00150199908009142
Web of Science ID

WOS:000082079100040

Author(s)
Klissurska, R. D.
Brooks, K. G.
Setter, N.  
Date Issued

1999

Published in
Ferroelectrics
Volume

225

Issue

1-4

Start page

1133

End page

1140

Subjects

donor

•

acceptor dopants microstructure pzt thin films

Note

Klissurska, RD Swiss Fed Inst Technol, Lab Ceram, Dept Mat Sci, CH-1015 Lausanne, Switzerland Swiss Fed Inst Technol, Lab Ceram, Dept Mat Sci, CH-1015 Lausanne, Switzerland Swiss Fed Inst Technol, Lab Photon & Interfaces, Dept Chem, CH-1015 Lausanne, Switzerland

227KG

Cited References Count:7

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LC  
Available on Infoscience
August 21, 2006
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/233381
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