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research article

Crack-free fully epitaxial nitride microcavity using highly reflective AllnN/GaN Bragg mirrors

Carlin, J. F.  
•
Dorsaz, J.  
•
Feltin, E.
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2005
Applied Physics Letters

We report the growth over 2 in. sapphire substrates of crack-free fully epitaxial nitride-based microcavities using two highly reflective lattice-matched AlInN/GaN distributed Bragg reflectors (DBRs). The optical cavity is formed by an empty 3lambda/2 GaN cavity surrounded by AlInN/GaN DBRs with reflectivities close to 99%. Reflectivity and transmission measurements were carried out on these structures, which exhibit a stopband of 28 nm. The cavity mode is clearly resolved with a linewidth of 2.3 nm. These results demonstrate that the AlInN/GaN system is very promising for the achievement of strong light-matter interaction and the fabrication of nitride-based vertical cavity surface emitting lasers. (C) 2005 American Institute of Physics. [DOI: 10.1063/1.1849851]

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Type
research article
DOI
10.1063/1.1849851
Web of Science ID

WOS:000226864600007

Author(s)
Carlin, J. F.  
•
Dorsaz, J.  
•
Feltin, E.
•
Butte, R.  
•
Grandjean, N.  
•
Ilegems, M.
•
Laugt, M.
Date Issued

2005

Published in
Applied Physics Letters
Volume

86

Issue

3

Article Number

1107

Subjects

CHEMICAL-VAPOR-DEPOSITION

•

MOLECULAR-BEAM EPITAXY

•

LIGHT-EMITTING

•

DIODE

•

ALGAN FILMS

•

GAN

•

WAVELENGTHS

Peer reviewed

REVIEWED

Written at

EPFL

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October 5, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/55038
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