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  4. HIGH-PURITY INP GROWN BY CHEMICAL BEAM EPITAXY
 
research article

HIGH-PURITY INP GROWN BY CHEMICAL BEAM EPITAXY

Rudra, A.
•
Carlin, J. F.  
•
Pavesi, L.
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1991
Journal of Electronic Materials

A Hall mobility as high as 176,200 cm2V-1s-1 at 77 K with N(d)-N(a) = 1.3 x 10(14) cm-3 has been obtained by adjusting the substrate and the phosphine cracker temperatures. The 2 K photoluminescence spectra show finely resolved excitonic transitions for layers grown above 535-degrees-C with linewidths of 0.07 meV. Excitonic transitions have been recorded between 2 and 250 K. The free exciton energy position leads to a highly accurate expression of the band gap energy, which extrapolates to E(g) = 1.347 eV at 300 K.

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Type
research article
DOI
10.1007/BF03030212
Author(s)
Rudra, A.
Carlin, J. F.  
Pavesi, L.
Piazza, F.
Proctor, M.
Ilegems, M.
Date Issued

1991

Published in
Journal of Electronic Materials
Volume

20

Issue

12

Start page

1087

End page

1090

Subjects

INP

•

PHOTOLUMINESCENCE

•

HALL MOBILITY

•

CBE

•

HIGH-QUALITY INP

•

TEMPERATURE-DEPENDENCE

•

VAPOR-DEPOSITION

•

EXCITONS

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LASPE  
Available on Infoscience
October 5, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/55119
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