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research article

HIGH-PURITY INP GROWN BY CHEMICAL BEAM EPITAXY

Rudra, A.
•
Carlin, J. F.  
•
Pavesi, L.
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1991
Journal of Electronic Materials

A Hall mobility as high as 176,200 cm2V-1s-1 at 77 K with N(d)-N(a) = 1.3 x 10(14) cm-3 has been obtained by adjusting the substrate and the phosphine cracker temperatures. The 2 K photoluminescence spectra show finely resolved excitonic transitions for layers grown above 535-degrees-C with linewidths of 0.07 meV. Excitonic transitions have been recorded between 2 and 250 K. The free exciton energy position leads to a highly accurate expression of the band gap energy, which extrapolates to E(g) = 1.347 eV at 300 K.

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Type
research article
DOI
10.1007/BF03030212
Author(s)
Rudra, A.
•
Carlin, J. F.  
•
Pavesi, L.
•
Piazza, F.
•
Proctor, M.
•
Ilegems, M.
Date Issued

1991

Published in
Journal of Electronic Materials
Volume

20

Issue

12

Start page

1087

End page

1090

Subjects

INP

•

PHOTOLUMINESCENCE

•

HALL MOBILITY

•

CBE

•

HIGH-QUALITY INP

•

TEMPERATURE-DEPENDENCE

•

VAPOR-DEPOSITION

•

EXCITONS

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LASPE  
Available on Infoscience
October 5, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/55119
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