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  4. Monitoring the energy of the metal ion-content plasma-assisted deposition and its implication for bacterial inactivation
 
research article

Monitoring the energy of the metal ion-content plasma-assisted deposition and its implication for bacterial inactivation

Rtimi, Sami  
•
Nadtochenko, Victor  
•
Khmel, Inessa
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February 15, 2019
Applied Surface Science

Cu-polyester (Cu-PES) was sputtered by high power impulse magnetron sputtering (HIPIMS) and by low energy direct current magnetron sputtering (DCMS). The total amount and distribution of the Ar+, Cu+ and Cu2+ ions were determined as well as the bacterial inactivation kinetics mediated by DCMS and HIPIMS samples. The separation of extracellular and intracellular processes leading to bacterial inactivation was assessed on normal and genetically modified E. coli.

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Type
research article
DOI
10.1016/j.apsusc.2018.10.207
Web of Science ID

WOS:000451023500087

Author(s)
Rtimi, Sami  
Nadtochenko, Victor  
Khmel, Inessa
Konstantinidis, Stephanos
Britun, Nikolay
Kiwi, John
Date Issued

2019-02-15

Publisher

ELSEVIER SCIENCE BV

Published in
Applied Surface Science
Volume

467

Start page

749

End page

752

Subjects

Chemistry, Physical

•

Materials Science, Coatings & Films

•

Physics, Applied

•

Physics, Condensed Matter

•

Chemistry

•

Materials Science

•

Physics

•

cu-polyester

•

magnetron sputtering

•

cu-ions

•

porinless bacteria

•

bacterial inactivation

•

surface-contact effect

•

hydrogen-peroxide

•

surfaces

•

water

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
GPAO  
LTP  
Available on Infoscience
January 23, 2019
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/153943
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