research article
Monitoring the energy of the metal ion-content plasma-assisted deposition and its implication for bacterial inactivation
February 15, 2019
Cu-polyester (Cu-PES) was sputtered by high power impulse magnetron sputtering (HIPIMS) and by low energy direct current magnetron sputtering (DCMS). The total amount and distribution of the Ar+, Cu+ and Cu2+ ions were determined as well as the bacterial inactivation kinetics mediated by DCMS and HIPIMS samples. The separation of extracellular and intracellular processes leading to bacterial inactivation was assessed on normal and genetically modified E. coli.
Type
research article
Web of Science ID
WOS:000451023500087
Author(s)
Date Issued
2019-02-15
Publisher
Published in
Volume
467
Start page
749
End page
752
Editorial or Peer reviewed
REVIEWED
Written at
EPFL
Available on Infoscience
January 23, 2019
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