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  4. Ultrafast Uv-Laser-Induced Oxidation of Silicon - Control and Characterization of the Si-Sio2 Interface
 
research article

Ultrafast Uv-Laser-Induced Oxidation of Silicon - Control and Characterization of the Si-Sio2 Interface

Richter, H.
•
Orlowski, T. E.
•
Kelly, M.
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1984
Journal of Applied Physics
  • Details
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Type
research article
DOI
10.1063/1.334273
Author(s)
Richter, H.
Orlowski, T. E.
Kelly, M.
Margaritondo, G.  
Date Issued

1984

Published in
Journal of Applied Physics
Volume

56

Issue

8

Start page

2351

End page

2355

Note

Univ wisconsin,dept phys,madison,wi 53706. Richter, h, xerox corp,webster res ctr,rochester,ny 14644.

ISI Document Delivery No.: TL568

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LSE  
LPRX  
Available on Infoscience
October 3, 2006
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/234356
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