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research article

Batch fabrication of gold-gold nanogaps by E-beam lithography and electrochemical deposition

Wu, Yexian  
•
Hong, Wenjing
•
Akiyama, Terunobu  
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2013
Nanotechnology

We report on the successful development of a well-controlled two-step batch nano-fabrication process to achieve nanometer-size gaps at the wafer scale. The technique is based on an optimized electron-beam lithography process, which enables the fabrication of nanogaps in the range (15 +/- 4) nm. Following this first step, the feedback-controlled electrochemical deposition of gold from an aqueous HAuCl4-based electrolyte is applied to further reduce the size of the gap down to about 0.3-1.0 nm. This protocol was successfully demonstrated by fabricating more than 385 nanogaps on a 4 inch wafer. The reproducible fabrication of nanogaps in the range between 0.3 and 1.0 nm opens up new perspectives for addressing the electrical and reactivity properties of single molecules and clusters in confined space under well-controlled conditions.

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Type
research article
DOI
10.1088/0957-4484/24/23/235302
Web of Science ID

WOS:000319327600009

Author(s)
Wu, Yexian  
•
Hong, Wenjing
•
Akiyama, Terunobu  
•
Gautsch, Sebastian  
•
Kolivoska, Viliam
•
Wandlowski, Thomas
•
de Rooij, Nico F.  
Date Issued

2013

Publisher

Institute of Physics

Published in
Nanotechnology
Volume

24

Issue

23

Article Number

235302

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
SAMLAB  
Available on Infoscience
October 1, 2013
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/95214
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